Heidelberg and Nano Vacuum are partnering up to provide a webinar series on some of their ANFF-relevant capabilities

The sessions will include a tool overview, a discussion of applications and case studies, then time for questions and answers

The first of these is on 24 June at 4pm AEST, and will focus on maskless lithography and their MLA systems. The rest of the schedule is:

Find more information and register here.