| Purpose | Spin coater for non-photo-sensitive polymer coating and baking of small samples |
| Location | RPF Lab 3021 |
| Material systems | Any material |
| Scale / volume | Can fit in up to 8 inch round wafer and 6 inch square substrate |
| Specs / resolution | The system has proximity, contact and vacuum contact baking capability |
Soft Lithography
Coater Brewer Science CB-200
PDMS Process Tools
| Purpose | Casting PDMS devices from a master to replicate features up to nanoscale |
| Location | RPF Lab 3021 |
| Material systems | Master material can be silicon, glass, aluminium, plastic, or polymer based substrate |
| Scale / volume | Throughput is up to one 4 inch device per hour |
| Specs / resolution | Can replicate features from 300nm and above |
PDMS Station
| Location | UNSW – Lower East lab (Grey Area) |
| Silicon Elastomer | Sylgard 184 (Dow Corning) |
| Thickness Range | PDMS membranes (10-500um)
PDMS blocks (1-10mm) |
