| Purpose | Exhausted wet bench used for handling of caustic based chemicals – primarily TMAH based developers |
| Location | Wet Etch Bay, RPF Cleanroom |
| Material systems | Wafers and/or photomasks; TMAH based developers |
| Scale / volume | Substrates up to 7 inch square in size |
| Specs / resolution | Includes automated spin and spray process unit for development of substrates |
Wet Processing
Caustic Develop Wet Bench (ReynoldsTech)
Chromium Etch Wet Bench (ReynoldsTech)
| Purpose | Exhausted wet bench used for handling of chromium etch chemicals |
| Location | Wet Etch Bay, RPF Cleanroom |
| Material systems | Photomask (chromium etch process); substrate (etch chromium structures) |
| Scale / volume | Etch substrates up to 7 inch square in size |
| Specs / resolution | Includes automated spin process unit |
EBL Spinner Wet Bench (ReynoldsTech)
| Purpose | Exhausted wet bench used for resist coating processes dedicated to electron beam lithography resists |
| Location | Wet Process Bay, RPF Cleanroom |
| Material systems | EBL resists |
| Scale / volume | Accommodates small samples up to 6 inch wafers |
| Specs / resolution | Includes two spinners dedicated to PMMA and CSAR / ZEP processes |
Etch Spin Rinse Dryer (ReynoldsTech)
| Purpose | Automated batch wafer cleaning tool |
| Location | Wet Etch Bay, RPF Cleanroom |
| Material systems | Can batch process substrates in a cassette |
| Scale / volume | 2 inch, 4 inch, and 6 inch wafers; 4 inch and 5 inch photomasks |
| Specs / resolution | Can accommodate up to 6 inch wafers, interchangeable rotors |
General Purpose Acid Wet Benches (ReynoldsTech)
| Purpose | Exhausted wet bench used for handling of general purpose acids |
| Location | Wet Etch Bay, RPF Cleanroom |
| Material systems | General acid chemicals; substrates |
| Specs / resolution | Includes two integrated stirring hotplates, heated and filtered process tank, and cascading tank for batch processing |
General Purpose Caustic Wet Bench (ReynoldsTech)
| Purpose | Exhausted wet bench used for handling of general purpose caustic based chemicals |
| Location | Wet Etch Bay, RPF Cleanroom |
| Material systems | General caustic / base chemicals; substrates |
| Specs / resolution | Includes integrated stirring hotplate, heated and filtered process tank, and cascading tank for batch processing |
HF Constant Temperature Bath
| Location | Upper East Lab (White Area) |
| Constant temperature bath | 30C |
| HF solutions available – Si/SiO2 only | HF 1:10 (HF 49% : DI water),
BHF 1:5 (HF49% : Ammonium fluoride 40%), BHF 1:15 (HF49% : Ammonium fluoride 40%) |
| HF solutions available – general purpose (GP) | BHF 1:15 (HF49% : Ammonium fluoride 40%) |
HF Wet Bench (ReynoldsTech)
| Purpose | Exhausted wet bench used for handling of hydrofluoric acid |
| Location | Wet Etch Bay, RPF Cleanroom |
| Material systems | Hydrofluoric acid |
| Scale / volume | Small samples up to 4 inch wafers |
| Specs / resolution | Includes heated process tank and cascading tank for rinsing |
Hotplate Tower (ReynoldsTech)
| Purpose | Exhausted stacked hotplates for baking during solvent based processes |
| Location | Wet Process Bay, RPF Cleanroom |
| Material systems | Resist baking |
| Scale / volume | Accommodates small samples up to 6 inch wafers |
| Specs / resolution | Includes 6 hotplates dedicated to different temperature ranges – used for baking / outgassing purposes |
Photo Spinner Wet Bench (ReynoldsTech)
| Purpose | Exhausted wet bench used for resist coating processes dedicated to thicker photolithography based resists |
| Location | Wet Process Bay, RPF Cleanroom |
| Material systems | Substrates to be coated with photoresist |
| Specs / resolution | Includes three spinners dedicated to positive, negative, and thick resist processes |
Process Spin Rinse Dryer (ReynoldsTech)
| Purpose | Automated batch wafer cleaning tool |
| Location | Wet Process Bay, RPF Cleanroom |
| Material systems | Can batch process substrates in a cassette |
| Scale / volume | 2 inch, 4 inch, and 6 inch wafers; 4 inch and 5 inch photomasks |
| Specs / resolution | Can accommodate up to 6 inch wafers, interchangeable rotors |
Solvent Develop Wet Bench (ReynoldsTech)
| Purpose | Exhausted wet bench used for solvent based development processes |
| Location | Wet Process Bay, RPF Cleanroom |
| Material systems | Solvents |
| Scale / volume | Accommodates small samples up to 6 inch wafers |
| Specs / resolution | Includes cold plate for cold development processes |
Solvent Lift-off Wet Bench (ReynoldsTech)
| Purpose | Exhausted wet bench used for solvent based metal lift-off and cleaning processes |
| Location | Wet Process Bay, RPF Cleanroom |
| Material systems | Substrates |
| Specs / resolution | Includes 3 heated ultrasonic tanks, an ambient filtered tank, and a cascading tank |
